Atomic layer deposition

Thin-film deposition technique that utilizes sequential gas phase chemical processes to create thin films with atomic-level precision. This method is extensively used in the semiconductor industry for its ability to produce uniform and conformal coatings, which are essential for advanced electronic devices. Atomic layer deposition is particularly beneficial for industries requiring high precision and control in material deposition, such as microelectronics and nanotechnology.

Atomic layer deposition was discovered on June 8th 2023 and it currently has a search volume of 3.6K with a growth of +41%.